Silane Gases
Keeping in mind the precise demands of clients, we also manufacture and supply a wide range of Silane. These Silanes are manufactured in accordance with international industry standards, to assure optimum performance. Owing to its application specific designs, these Silanes are hugely recommended by large number of industries. Silanes offered by us are available at cost effective rate.
Features:
- Application specific
- Cost-effective
- Safe
| Description | Grade Impurities (Gas Phase) | 99.999% (N5.0) (excluding H2) (Vol. PPM) |
| Silane is a colourless gas with a repulsive odour at room temperature and atmospheric pressure. In its pure state it is spontaneously combustible in air but is indefinitely stable in metal containers. Metals anlysis data is available on request. |
Hydrogen | * 50 |
| Nitrogen | 1 | |
| Oxygen + Argon | 1 | |
| Carbon Monoxide | 0.2 | |
| Carbon Dioxide | 0.2 | |
| Hydrogen | 1 | |
| Moisture | 0.1 | |
| THC as methane | 0.2 | |
| Other H/C | 0.5 | |
| Trichlorosilane | 0.5 | |
| Dichlorosilane | 0.5 | |
| Disilane | 0.5 | |
| Resistivity > 10,000 ohm.com | * <10 ppm in aluminium cylinders | |
| Cylinder Size | Volume (Kg) | Pressure (Bar) |
| B10st | up to 3 | up to 165 |
| B44st (A) | up to 13.2 | up to 165 |
| B50st / al | up to 15 | up to 165 |
| Cylinder Data |
| Supplied as a high pressure gas in seamless steel or aluminium cylinders. Standard sizes / Volumes as listed - Larger volumes available on request. |
| Deluxe GAS can supply any internationally recognised valve type. For Silane the standard international valve types are as follows | |
| American | CGA 350 / DISS 632 |
| European | DIN 477 - 1 |
| Gas Data | |
| Mol. Weight | 32.11 |
| Boiling Point | -111.5°C |
| Density | 1.114 kg/cm 3 |
Recommended Regulator
Single stage stainless steel body with stainless steel internals.
Deluxe GAS has a variety of suitable handling equipment for this product - please enquire.
Typical Applications
Used as a source of high purity silicon in the electroincs industry for thin film deposits and the formation of high purity silicon oxides.
